TY - JOUR T1 - Epitaxial growth of relaxed germanium layers by reduced pressure chemical vapour deposition on (110) and (111) silicon substrates JO - Thin Solid Films PY - 2011/01/01 AU - Nguyen VH AU - Dobbie A AU - Myronov M AU - Norris DJ AU - Walther T AU - Leadley DR ED - Y2 - 2025/05/31 ER -