TY - CONF T1 - The chemistry of thin film deposits formed from hexamethyldisiloxane and hexamethyldisilazane plasmas JO - The Mechanics of Thin Film Coatings UR - http://dx.doi.org/10.1142/9789814503914_0031 PY - 2014/01/14 AU - Bushnell-Watson SM AU - Alexander MR AU - Ameen AP AU - Rainforth WM AU - Short RD AU - Jones FR AU - Michaeli W AU - Stollenwerk M AU - Mathar G AU - Zabold J ED - DO - DOI: 10.1142/9789814503914_0031 PB - WORLD SCIENTIFIC Y2 - 2025/05/23 ER -